Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws | Open Data UNEx

https://opendata.unex.es/recurso/ciencia-tecnologia/investigacion/publicaciones/Publicacion/2004-311

Literals

bibo:page_range
- 3569-3575
fabio:hasPublicationYear
- 2004
ou:bibtex
- @article{RID:0719151526166-20, title = {Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws}, journal = {Journal of Materials Research}, year = {2004}, author = {Jung, YG and Pajares, A and Lawn, BR}, volume = {19}, number = {12}, pages = {3569-3575} }
dcterms:contributor
- Jung, YG, Pajares, A, Lawn, BR
ou:eid
- 2-s2.0-12844270009
dcterms:creator
- Jung Y.G.
bibo:doi
- 10.1557/jmr.2004.0454
vivo:identifier
- 2004-311
bibo:issn
- 0884-2914
dcterms:publisher
- Journal of Materials Research
ou:tipoPublicacion
- Article
dcterms:title
- Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws
vcard:url
- https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=12844270009&origin=inward
ou:urlOrcid
- http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000225559900017&KeyUID=WOS:000225559900017
ou:urlScopus
- https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=12844270009&origin=inward
ou:vecesCitado
- 14
bibo:volume
- 19

Inverse Relations

Has related: ou:tienePublicacion
- ANTONIA PAJARES VICENTE

Recognized prefixes

bibo (http://purl.org/ontology/bibo/)
dcterms (http://purl.org/dc/terms/)
fabio (http://purl.org/spar/fabio/)
ou (https://opendata.unex.es/def/ontouniversidad#)
vcard (http://www.w3.org/2006/vcard/ns#)
vivo (http://vivoweb.org/ontology/core#)