Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws

Literals

• ou:vecesCitado
  • 14
• fabio:hasPublicationYear
  • 2004
• dcterms:contributor
  • Jung Y.G.
• ou:bibtex
  • @article{RID:0719151526166-20, title = {Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws}, journal = {Journal of Materials Research}, year = {2004}, author = {Jung, YG and Pajares, A and Lawn, BR}, volume = {19}, number = {12}, pages = {3569-3575} }
• ou:eid
  • 2-s2.0-12844270009
• dcterms:creator
  • Jung Y.G.
• bibo:doi
  • 10.1557/jmr.2004.0454
• vivo:identifier
  • 2004-311
• bibo:issn
  • 0884-2914
• bibo:page_range
  • 3569-3575
• dcterms:publisher
  • Journal of Materials Research
• ou:tipoPublicacion
  • Article
• dcterms:title
  • Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws
• vcard:url
  • https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=12844270009&origin=inward
• ou:urlOrcid
  • http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000225559900017&KeyUID=WOS:000225559900017
• ou:urlScopus
  • https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=12844270009&origin=inward
• bibo:volume
  • 19

Typed Literals

• dcterms:created
  • 2004-12-01T00:00:00 (xsd:dateTime)

Inverse Relations

• Has related: ou:tienePublicacion
  • ANTONIA PAJARES VICENTE