PUBLICACIÓN
Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws
Jung, YG, Pajares, A, Lawn, BR
2004 Journal of Materials Research
CITAS
14
DOI
10.1557/jmr.2004.0454
EID
2-s2.0-12844270009
ISSN
0884-2914
BIBTEX
@article{RID:0719151526166-20, title = {Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws}, journal = {Journal of Materials Research}, year = {2004}, author = {Jung, YG and Pajares, A and Lawn, BR}, volume = {19}, number = {12}, pages = {3569-3575} }
AUTORES DE LA UEX