PUBLICACIÓN

Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws

ACCEDER A LA PUBLICACIÓN: Scopus Orcid

Jung, YG, Pajares, A, Lawn, BR

2004 Journal of Materials Research


CITAS

14

DOI

10.1557/jmr.2004.0454

EID

2-s2.0-12844270009

ISSN

0884-2914

BIBTEX

@article{RID:0719151526166-20, title = {Effect of oxide and nitride films on strength of silicon: A study using controlled small-scale flaws}, journal = {Journal of Materials Research}, year = {2004}, author = {Jung, YG and Pajares, A and Lawn, BR}, volume = {19}, number = {12}, pages = {3569-3575} }


AUTORES DE LA UEX