PUBLICACIÓN
Influence of oxygen and free radicals promoters on the UV-254nm photolysis of diclofenac
Rivas J., Gimeno O., Borralho T., Beltran F.
2010 CHEMICAL ENGINEERING JOURNAL
Chemical Engineering (miscellaneous) (Q1), Chemistry (miscellaneous) (Q1), Environmental Chemistry (Q1), Industrial and Manufacturing Engineering (Q1)
JCR: 3.074
SJR: 1.246
CITAS
31
DOI
10.1016/j.cej.2010.07.027
EID
2-s2.0-77956296544
ISSN
1385-8947
BIBTEX
@article { rivas2010,title = {Influence of oxygen and free radicals promoters on the UV-254nm photolysis of diclofenac},journal = {Chemical Engineering Journal},year = {2010},volume = {163},number = {1-2},pages = {35-40},author = {Rivas, J. and Gimeno, O. and Borralho, T. and Beltrán, F.}}
AUTORES DE LA UEX