PUBLICACIÓN

Influence of oxygen and free radicals promoters on the UV-254nm photolysis of diclofenac

ACCEDER A LA PUBLICACIÓN: Scopus Orcid

Rivas J., Gimeno O., Borralho T., Beltran F.

2010 CHEMICAL ENGINEERING JOURNAL

Chemical Engineering (miscellaneous) (Q1), Chemistry (miscellaneous) (Q1), Environmental Chemistry (Q1), Industrial and Manufacturing Engineering (Q1)

JCR: 3.074

SJR: 1.246


CITAS

31

DOI

10.1016/j.cej.2010.07.027

EID

2-s2.0-77956296544

ISSN

1385-8947

BIBTEX

@article { rivas2010,title = {Influence of oxygen and free radicals promoters on the UV-254nm photolysis of diclofenac},journal = {Chemical Engineering Journal},year = {2010},volume = {163},number = {1-2},pages = {35-40},author = {Rivas, J. and Gimeno, O. and Borralho, T. and Beltrán, F.}}


AUTORES DE LA UEX