PUBLICACIÓN
Influence of oxygen and free radicals promoters on the UV-254nm photolysis of diclofenac
Rivas J.; Gimeno O.; Borralho T.; Beltran F.
2010 CHEMICAL ENGINEERING JOURNAL
Chemical Engineering (miscellaneous) (Q1), Chemistry (miscellaneous) (Q1), Environmental Chemistry (Q1), Industrial and Manufacturing Engineering (Q1)
JCR: 3.074
SJR: 1.246
CITAS
31
DOI
10.1016/j.cej.2010.07.027
EID
2-s2.0-77956296544
ISSN
1385-8947
BIBTEX
@article { rivas2010,title = {Influence of oxygen and free radicals promoters on the UV-254nm photolysis of diclofenac},journal = {Chemical Engineering Journal},year = {2010},volume = {163},number = {1-2},pages = {35-40},author = {Rivas, J. and Gimeno, O. and Borralho, T. and Beltrán, F.}}
AUTORES DE LA UEX
